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PhD position: Pushing the fundamental limits of the emission of EUV light by dense laser-produced-plasmas
Published
(540 days ago)
Full-time position
ARCNL
The Netherlands
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry.
ARCNL’s research programme is presently formed by 8 research groups, and a large part of the research programme is devoted to physical and chemical processes crucial for nanolithography with extreme ultraviolet (EUV) light, i.e. physics at the play in generation EUV light, development of methods using EUV light for lensless imaging and surface sciences for optics and contact dynamics.
ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is building up towards a size of approximately 100 scientists and support staff.
PhD position: Pushing the fundamental limits of the emission of EUV light by dense laser-produced-plasmas
The PhD project aims at the fundamental understanding of the emission of light by dense laser-produced tin plasmas at the atomic level, and at using this understanding to push the limits of the efficiency of plasma sources of extreme ultraviolet (EUV) light for nanolithography. Which physical processes determine the efficiency of the conversion of drive laser energy into EUV power and how can this be optimized? Answering these questions by focusing on the fundamentals of atomic plasma processes, through detailed time-resolved spectroscopic investigations and advanced laser control, will pave the way for better, more efficient sources. The PhD student will be embedded in the EUV Plasma Processes team at ARCNL, but will also be actively involved in experiments at external laboratories and (industrial) facilities. This project is part of an NWO-VIDI grant titled “New light for nanolithography”.
About the group
The research activities of the EUV Plasma Processes group aim at the understanding of the basic dynamics on an atomic and molecular level of the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.
Qualifications
You have an MSc in (applied) physics. Knowledge in the fields of laser physics, atomic and molecular physics, or vacuum technology is advantageous. Good verbal and written communication skills (in English) are required.
Terms of employment
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service ofthe Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years. After successful completion of the PhD research a PhD degree will be granted at the Vrije Universiteit Amsterdam (VU). Training is important to us. We, therefore, offer you several courses that have been developed specifically for PhD-students. Do you come from abroad? ARCNL will assist you with visa applications and compensate your transport costs and furnishing expenses.
Contact info
Dr. Oscar Versolato
Group leader EUV Plasma Processes
Phone: +31 (0)20-851 7100
Application
Please go to the ARCNL website, choose this job ad and use the button 'Apply for this position' at the bottom of that advertisement.
Please send your:
– Resume;
– Motivation on why you want to join the group (max. 1 page).
It is important to us to know why you want to join our team. This means that we will only consider your application if it entails your motivation letter.
ARCNL
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